| 摘要 |
<p>PURPOSE:To enhance the accuracy, economical efficiency, etc. of the manufacture of a metal photomask by using a material showing etching speed lower than that of a pattern forming layer to form a light-transmissive electrically-conductive film for preventing discharge on a plate for the photomask. CONSTITUTION:On glass substrate 1 light-transmissive electrically-conductive film 5, pattern forming film 2 such as Cr film and pattern forming film 3 such as Cr oxide film are laid to form a plate for a metal photomask. Film 5 is made of material such as titanium oxide showing etching speed lower than that of the materials of films 2, 3 in an etching process for forming a pattern. Film 5 has about 1,000Angstrom thickness and about 10<2>-10<3>OMEGA/square sheet resistance. Pattern forming films 2, 3 are selectively removed by plasma etching with CCl4 gas or other method to convert the plate into the metal photomask.</p> |
