发明名称 |
Semiconductor contact resistance reduction - by sawtooth or other magnified contact surfaces |
摘要 |
<p>A semiconductor device is bounded at least one side by a metal electrode which contacts it without any barrier. The contact area between semiconductor and metal electrode has been increased by designing the contact area in cross-section with an undulating, sawtooth, or meandering profile. The periodicity of the alternating structure is at least equal to the thickness of the space charge region of the metal-semiconductor tunnel contact. This reduces the contact resistance of multi-layer semiconductor devices with a barrier layer between the layers.</p> |
申请公布号 |
DE2929939(A1) |
申请公布日期 |
1981.02.19 |
申请号 |
DE19792929939 |
申请日期 |
1979.07.24 |
申请人 |
LICENTIA PATENT-VERWALTUNGS-GMBH |
发明人 |
BENDIG,HANS;KOHN,ERHARD,DR.-ING. |
分类号 |
H01L21/263;H01L21/283;H01L21/288;H01L21/306;H01L23/482;H01L29/06;H01L29/41;H01L29/417;(IPC1-7):H01L29/44;H01L29/52 |
主分类号 |
H01L21/263 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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