发明名称 Semiconductor contact resistance reduction - by sawtooth or other magnified contact surfaces
摘要 <p>A semiconductor device is bounded at least one side by a metal electrode which contacts it without any barrier. The contact area between semiconductor and metal electrode has been increased by designing the contact area in cross-section with an undulating, sawtooth, or meandering profile. The periodicity of the alternating structure is at least equal to the thickness of the space charge region of the metal-semiconductor tunnel contact. This reduces the contact resistance of multi-layer semiconductor devices with a barrier layer between the layers.</p>
申请公布号 DE2929939(A1) 申请公布日期 1981.02.19
申请号 DE19792929939 申请日期 1979.07.24
申请人 LICENTIA PATENT-VERWALTUNGS-GMBH 发明人 BENDIG,HANS;KOHN,ERHARD,DR.-ING.
分类号 H01L21/263;H01L21/283;H01L21/288;H01L21/306;H01L23/482;H01L29/06;H01L29/41;H01L29/417;(IPC1-7):H01L29/44;H01L29/52 主分类号 H01L21/263
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