发明名称 METHODS OF DEPOSITING CADMIUM SULPHIDE ON SEMICONDUCTOR MATERIAL
摘要 A hydrogen transport process for cleaning the surface of an indium or gallium based semiconductor material and for depositing n-type cadmium sulfide on the cleaned semiconductor material is disclosed. The cleaning and deposition can be accomplished in sequence or simultaneously. The process entails adding hydrogen sulfide to a hydrogen gas flow in a chemical vapor deposition process. Single crystalline photovoltaic cells of p-InP/n-CdS with a 13.5% efficiency have been reproducibly fabricated. An efficiency of 4.6% has been obtained with a thin layer polycrystalline p-InP/n-CdS cell. Additionally, a p-GaAs/n-CdS heterodiode cell has been produced.
申请公布号 GB1584873(A) 申请公布日期 1981.02.18
申请号 GB19770035074 申请日期 1977.08.22
申请人 WE 发明人
分类号 C30B29/50;C23C16/02;H01L21/306;H01L21/363;H01L21/365;H01L29/04;H01L29/267;H01L31/04;H01L31/072;H01L31/18 主分类号 C30B29/50
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