Relief patterning of fabric surface - by heat-embossing followed by monomer surface-grafting by high-energy beta-radiation

摘要

Single-step process for producing a relief pattern on a fabric surface uses a differential heat-treatment to vary the absorption characteristics of the fabric, which is then treated with a liquid monomer and subjected to high-energy radiation to polymerise the monomer and graft it onto the fabric surface. Differential shrinkage produces a three-dimensional surface texture. Process produces novel effects by a single operation, which simultaneously improves dyeability, moisture absorption, and anti-static behaviour.