发明名称 WORK STAGE DEVICE
摘要 <p>PURPOSE:To fix a work without damaging the flatness of the work at all while improving the accuracy of movement of the work by movably supporting a work stage along a pair of guide rails between the guide rails in an attitude in which a work fixing surface on which the work is fastened is made perpendicular. CONSTITUTION:A wafer 8 as a work is fast stuck and sucked and fixed to a work fixing surface 45 in a work stage 20 by a vacuum chuck. The work stage 20 is shifted along guide rails 21, 22 while being accompanied by the rolling of each roller by a drive 47. Pre-load is applied to rollers 27-29, 37-39, a rail body 24 is held by the rollers 27-29 and 30-32, and a rail body 23 is held by the rollers 37-39 and 40-42. Pre-load is applied to rollers 35, 36, and an underside 23a is pushed. Consequently, the work stage 20 is moved accompanied by rocking in the vertical direction to the work fixing surface 45 at all. Accordingly, the wafer 8 is shifted stably while excellent flatness is kept, thus accurately conducting exposure to the wafer 8.</p>
申请公布号 JPH01106439(A) 申请公布日期 1989.04.24
申请号 JP19870263348 申请日期 1987.10.19
申请人 FUJITSU LTD 发明人 KOYAKATA KO
分类号 H01L21/68 主分类号 H01L21/68
代理机构 代理人
主权项
地址