发明名称 FABRICATION OF DIFFRACTIVE SUBTRACTIVE FILTER EMBOSSING MASTER
摘要 <p>RCA 70,656 FABRICATION OF DIFFRACTIVE SUBTRACTIVE FILTER EMBOSSING MASTER A recording blank, composed of at least one diffraction grating substrate, such as nickel, covered with a layer of photoresist is used to produce an embossing master by exposing the photoresist to picture information composed of respective white and non-white manifesting regions; developing the exposed photoresist to reveal the grating portions underlying solely the white manifesting regions; electroplating and/or etching the revealed portions to flatten and obliterate the revealed grating portions, and then removing the remainder of the photoresist.</p>
申请公布号 CA1095311(A) 申请公布日期 1981.02.10
申请号 CA19770275233 申请日期 1977.03.31
申请人 RCA CORPORATION 发明人 GALE, MICHAEL T.;KANE, JAMES
分类号 G03B33/00;G02B27/42;G03F7/00;(IPC1-7):03C5/00 主分类号 G03B33/00
代理机构 代理人
主权项
地址