| 摘要 |
<p>METHOD OF UTILIZING INTERFEROMETRIC INFORMATION FROM TWO DIFFERENT HOLOGRAMS EXPOSED WITH SHORT INTERVAL A holographic interferometer for measuring the deformation of an object or mechanical structure by exposing two hologram plates to a light source and a reference beam. The hologram plates are positioned closely adjacent one another with one of the hologram plates positioned in front of the other and both of the hologram plates are rigidly connected to each other. Both of the hologram plates are moved together during and between exposures to the light source to thereby obtain exposures on different portions of the hologram plates. Both of the hologram plates are exposed at the same time, each of the hologram plates being exposed in a short time interval to light reflected by the object and the reference beam to thereby obtain exposures on different portions of the hologram plates due to the predetermined movement of the hologram plates between exposures.</p> |
