发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING DEVICE
摘要 PURPOSE:To prevent deterioration of withstand voltage between electrodes by having the roundish-shaped semiconductor surface between two kinds of electrodes. CONSTITUTION:The shape of an angle 7 of the stepped section between a cathode layer 6 and a gate electrode lead out section 3 is gently sloped. Consequently, the adhesion of a passivation film 8 at this section is excellent. Moreover, as a resist film can be applied uniformly at the angle section, the passivation film 8 is not broken off when making an opening by photo etching. Accordingly, the oxide film 8 can be formed on the whole surface of the necessary section as a normal passivation film 8.
申请公布号 JPS5612770(A) 申请公布日期 1981.02.07
申请号 JP19790086858 申请日期 1979.07.11
申请人 HITACHI LTD 发明人 OIKAWA SABUROU;TERASAWA YOSHIO;YAO TSUTOMU;NAGANO TAKAHIRO;OKAMURA MASAHIRO
分类号 H01L29/74;H01L29/10;H01L29/739;(IPC1-7):01L29/74 主分类号 H01L29/74
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