| 摘要 |
PURPOSE:To manufacture a high quality hard mask without using an emulsion dry plate by selectively applying laser beams to a protective film formed on a light shielding film on a substrate, developing the protective film, and etching the light shielding film using the remaining protective film as a mask. CONSTITUTION:On glass substrate 1 light shielding film such as Cr film 2 and thermosetting protective film 3 are fomed. Laser beams 5 are applied to film 3 according to a predetermined pattern, and film 3 is developed to remove the unexposed portion of film 3 and only exposed portion 3' is remained. Using remaining exposed portion 3' as a mask film 2 is etched to remove the naked portion of film 2, and then portion 3' (exposed portion) of film 3 is removed to obtain a hard mask. |
