发明名称 Ionization resistant MOS structure
摘要 A structure and method for preventing minority carriers caused by an alpha particle, or the like, from drifting into storage regions and causing a false data bit. In a high density MOS circuit, a single alpha particle including one originating within the substrate or circuit package can generate enough carriers to give a false data bit. A minority carrier reflective barrier is employed to prevent substantial numbers of minority carriers from drifting into the active layer. In the presently preferred embodiment, this barrier is formed by ion implanting the upper surface of the substrate.
申请公布号 US4247862(A) 申请公布日期 1981.01.27
申请号 US19780922225 申请日期 1978.07.05
申请人 INTEL CORPORATION 发明人 KLEIN, RAPHAEL
分类号 H01L21/265;H01L23/556;H01L27/108;(IPC1-7):H01L27/04 主分类号 H01L21/265
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