| 摘要 |
Doped silica glass is deposited by means of reactive deposition from the gas phase by the action of a nonisothermal plasma, on the inside of a quartz glass tube. The coated tube is collapsed and the preform thus obtained is drawn into an optical fiber. During the deposition procedure the tube inside diameter between 6 and 30 mm must satisfy the formula (M/AI) 1/3.58x1 mm</=d wherein M is the deposition rate of doped quartz glass in grams per minute and AI has the value 1.42x10-4 g/min. At the end of the deposition, prior to collapsing, the inside diameter must satisfy the equation (M/AII) 1/3.04x1 mm>/=d AII having the value 6.63x10-5 g/min. |
