发明名称 AUTOMATIC EVAPORATION APPARATUS
摘要 PURPOSE:To decrease the operating cycle time and to prevent the pollution of the evaporated material, by installing a preliminary vacuum chamber on one side, or one chamber on each of both sides, of a vacuum evaporation chamber through gate valves, and by closing tightly both the chambers separately or connectedly, and by installing a transferring means for wafer jigs from one chamber to another. CONSTITUTION:A wafer jig 1 mounted with plural wafers 2 is set in the first preliminary vacuum chamber 12, and the chamber 12 is evacuated to a vacuum by a vacuum pump 4. The wafers 2 are preliminarily heated by a heater 9 while the wafer jig 1 is rotated and revolved by a driving shaft 21, then the wafer jig is moved in vacuum by opening the gate valve 14 equipped between the preliminary chamber 12 and the vacuum evaporation chamber 3 which is at a high vacuum. After that the gate valve 14 is closed, a gate 5 is opened, and the wafer jig 1 is set in the vacuum evaporation chamber, where evaporation source 7 is evaporated by electron beams to conduct evaporation metallizing while the wafer jig 1 being rotated and revolved by the driving shaft 21. Subsequently, a gate valve 15 is opend, and the wafer jig 1 is transferred to the second preliminary vacuum chamber 13, and is taken out to the outside. In a small chamber of the vacuum evaporation chamber is set a measuring means for evaporation quantity composed of a quartz vibrator.
申请公布号 JPS565977(A) 申请公布日期 1981.01.22
申请号 JP19790081353 申请日期 1979.06.29
申请人 HITACHI LTD;HITACHI ELECTR ENG 发明人 SATOU AKIHIKO;NAKAMURA SOUICHIROU;SUGIMOTO KINYA;MURAKAWA YUKIO
分类号 C23C14/56 主分类号 C23C14/56
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