发明名称 PHOTOSENSITIVE MATERIAL AND PATTERN FORMING METHOD USING IT
摘要 PURPOSE:To enable both positive and negative images to be obtd. with the same photosensitive material by placing a photosensitive layer contg. an o-quinone diazide compound and a specified quinone compound or a specified aromatic ketone compound which reacts with a photoreaction product of the diazide compound. CONSTITUTION:A photosensitive material is produced having a photosensitive layer contg. 1pt.wt. o-quinone diazide compound and about 0.005-1pt.wt. quinone compound such as anthraquinone or phenanthraquinone or an aromatic ketone such as xanthone, perinaphthenone or benzophenone which reacts with a photoreaction product of the diazide compound directly or in the presence of catalyst. This photosensitive material is imagewise exposed, and a pattern is formed by alkali development to obtain a positive image. By subjecting the material to imagewise exposure, heating, reexposure and the same alkali development, a negative image is obtd. Thus, the material is used as a photosensitive material with superior image resolving power.
申请公布号 JPS566236(A) 申请公布日期 1981.01.22
申请号 JP19790081659 申请日期 1979.06.28
申请人 FUJI PHOTO FILM CO LTD 发明人 TACHIKAWA HIROMICHI;TAKAHASHI YOUNOSUKE;SHINOZAKI FUMIAKI;IKEDA TOMOAKI
分类号 G03C1/72;G03F7/004;G03F7/022;G03F7/26;H01L21/027 主分类号 G03C1/72
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