| 摘要 |
PURPOSE:To make holdable in horizontality with easy adjustment, by supporting two plate springs, holding a parallel holding member in between, on a center strut, and setting up an armature and a magnetic attraction mechanism in this strut, in a fine adjusting stage of a semiconductor equipment or the like. CONSTITUTION:A first plate spring 2 is attached to an upper end of a center strut 1 and also a second plate spring 3, supporting a sample stage 4 on an outer circumferential part, is attached thereto in holding a parallel holding member 5 in between. At about 120 deg. on the circumference of the plate spring 2, an armature 6 is locked to a lower surface of a setting ring part 23 by a setting part 61, and armature gaps (h) and (h) are installed there, then a pair of magnetic attraction mechanisms 7 and 7a are attached to the center strut 1 via a holder 11. When a current is made to flow into these magnetic attraction mechanisms 7 and 7a, the armature 6 is minutely displaced up and down and simultaneously each other circumferential part of these plate springs 2 and 3 is minutely displaced as well, thus the sample stage 4 is finely adjusted. And, even if there is radial ununiformed flection in these plate springs 2 and 3, rheostats R1, R2 and R3 are adjusted and each current value in these magnetic attraction mechanisms 7 and 7a is altered whereby the sample stage 4 is kept in horizontality. |
