| 摘要 |
<p>PLANETARY EVAPORATOR A planetary evaporator having at least one source of material for coating, by evaporation, workpieces such as semiconductor wafers. The apparatus includes a pallet mounted for rotation about its own axis, and substrate or workpiece holders on the pallet which are mounted for rotation therewith. Guides support the pallets and a cam follower on the pallet follows a cam to effect reciprocation of the pallet as it rotates, the guides being adapted for rotation about another axis which is substantially perpendicular to the axis of rotation of the pallet. In another embodiment the substrate holders are also rotated so as to give four degrees of freedom of the workpiece or substrate relative to the material source. The purpose of this abstract is to enable the public and the Patent Office to determine rapidly the subject matter of the technical disclosure of the Application. This abstract is neither intended to define the invention of the Application nor is it intended to be limiting as to the scope thereof.</p> |
