发明名称 |
ELECTRICAL HYDROMECHANICAL METHOD FOR MANUFACTURING SEMICONDUCTIR THIN FILM |
摘要 |
A method of preparing a thin film of a semiconductor material on a substrate, in which charged microdroplets of the semiconductor material or a constituent thereof are generated by electrohydrodynamic (EHD) extraction of the droplets from a meniscus forced at an elongate tip of a nozzle containing the material in a molten state, the EHD extraction occurring under the influcence of a high electric field produced by an extractor electrode adjacent the tip of the nozzle. The microdroplets are then accelerated away from the elongate tip of the nozzle to form a two-dimensional ribbon-like beam or blanket of the charged microdroplets. The two-dimensional beam is directed onto the trailing edge of a target carried on a moving substrate such that a film of the semiconductor material is formed on the substrate by deposition of the microdroplets on the trailing edge of the moving target. |
申请公布号 |
JPS62169319(A) |
申请公布日期 |
1987.07.25 |
申请号 |
JP19860235507 |
申请日期 |
1986.10.04 |
申请人 |
JIYAN JIYUURU ASHIRU ROBIRAARU;JIYON BANNAADO |
发明人 |
JIYAN JIYUURU ASHIRU ROBIRAARU |
分类号 |
H01L31/04;C23C26/02;C30B15/00;C30B15/08;H01L21/18;H01L21/208 |
主分类号 |
H01L31/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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