发明名称 ELECTRICAL HYDROMECHANICAL METHOD FOR MANUFACTURING SEMICONDUCTIR THIN FILM
摘要 A method of preparing a thin film of a semiconductor material on a substrate, in which charged microdroplets of the semiconductor material or a constituent thereof are generated by electrohydrodynamic (EHD) extraction of the droplets from a meniscus forced at an elongate tip of a nozzle containing the material in a molten state, the EHD extraction occurring under the influcence of a high electric field produced by an extractor electrode adjacent the tip of the nozzle. The microdroplets are then accelerated away from the elongate tip of the nozzle to form a two-dimensional ribbon-like beam or blanket of the charged microdroplets. The two-dimensional beam is directed onto the trailing edge of a target carried on a moving substrate such that a film of the semiconductor material is formed on the substrate by deposition of the microdroplets on the trailing edge of the moving target.
申请公布号 JPS62169319(A) 申请公布日期 1987.07.25
申请号 JP19860235507 申请日期 1986.10.04
申请人 JIYAN JIYUURU ASHIRU ROBIRAARU;JIYON BANNAADO 发明人 JIYAN JIYUURU ASHIRU ROBIRAARU
分类号 H01L31/04;C23C26/02;C30B15/00;C30B15/08;H01L21/18;H01L21/208 主分类号 H01L31/04
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