| 摘要 |
PURPOSE:To reduce the influence of mask reference marks of an exposure apparatus main part side upon exposed pictures and facilitate widening the exposed area by a method wherein a plurality of sets of the position reference marks are provided on the apparatus main part side and alignment marks of originals are arranged in such a manner that the alignment marks of one original does not come to the boundaries between itself and other originals. CONSTITUTION:Mask reference marks 17 of an apparatus side are attached to a fitting table 18. A microscope 19 measures the alignment mark of a mask and the mask reference marks 17 and an electric processor 20, which measures the alignment marks of a mask 1 and a substrate 3, converts image signals of the two marks into electric signals to measure relative displacements of the two marks and transmits signals to drive a mask stage 2 to align the mask 1 with a predetermined position. |
