发明名称 RESIST DEVELOPING APPARATUS
摘要 PURPOSE:To suppress the variation of resist sensitivity caused by the temperature fluctuation of developer to the minimum by predetermining the temperature of the developer arbitrarily. CONSTITUTION:A supporting means of an object W to be developed is provided in a development vessel 1 and a control means A which supplies developer to the object W supported by the supporting means is provided. The supporting means A is composed of, for instance, a spouting means 2 such as a nozzle, a control valve 61, a strainer 62 and so forth and connected to a developer container 3 through a temperature regulator 5. The control means A is covered with a thermostatic oven 35 which has a heat medium jacket 30 linked with a thermostatic heat medium generator 7. With this constitution, the developer supplied to the development vessel 1 is protected from influence of the atmosphere so that the temperature of the developer can be controlled at the predetermined value with a high accuracy.
申请公布号 JPS62183526(A) 申请公布日期 1987.08.11
申请号 JP19860026433 申请日期 1986.02.07
申请人 NIPPON TELEGR & TELEPH CORP <NTT>;DAIKIN IND LTD 发明人 MIYOSHI KAZUNARI;MORIYA SHIGERU;TAKEI TOSHITAKA;FUNATSU TSUNEMASA;KAWABATA KATSUHIRO
分类号 H01L21/30;G03F7/00;G03F7/30;H01L21/027 主分类号 H01L21/30
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