发明名称 ELECTROSTATIC INDUCTION TYPE SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
摘要 PURPOSE:To contrive the diversity of logic functions of an electrostatic induction type semiconductor integrated circuit device by introducing a novel structure divided with a gate electrode to the logic functions of the SITL to add a NOR logic thereto. CONSTITUTION:The n-type epitaxial layer 12 on an n<+>-type substrate 11 is isolated with an SiO2 layer 16 to selectively form p-type layers 13, 14 and an n<+>-type layer 15 thereon. The layers 13-12-14a and the layer 13-12-14b, and the layer 13-12- 14c form lateral pnp transistor 103, which operate as a constant current source. The layer 15-14a-14c-12, 13 form a SIT 104, which operates as a switcing transistor. Approx. 0.8 volt is applied to an injector layer 13 with respect to the substrate 11 in operation. When all gates G1-G3 are 0 volt, it is depleted from the layer 14 to the SiO2 film 16 to cause the SIT to be pinched off. When one of the gates becomes 0.8 volt, a channel is produced partly under the layer 15 to become on. Accordingly, this switching element has three-input NOR logic function with the gates G1-G3 as input terminals, the D as an output terminal. In this manner, the NOR logic is added to the conventional NOR and AND logics to increase the logic function of the SITL.
申请公布号 JPS561561(A) 申请公布日期 1981.01.09
申请号 JP19790075865 申请日期 1979.06.15
申请人 MITSUBISHI ELECTRIC CORP 发明人 KATOU SHIYUUICHI
分类号 H01L29/80;C25D21/12;H01L21/8222;H01L27/02;H01L27/06 主分类号 H01L29/80
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