发明名称 METHOD AND DEVICE FOR CORRECTING WHITE SPOT DEFECT OF PHOTOMASK
摘要 <p>PURPOSE:To correct a white spot defect, by bringing a metal film on a correction plate and the pattern surface of a mask into tight contact with each other and irradiating laser light upon a white spot defect portion to vaporize the metal film. CONSTITUTION:A metal film 9b provided on a correction plate 8, which is manufactured by coating the metal film on a glass plate 9a, is overlapped on the surface of the Cr pattern 2b of a glass plate 2a. Exhaust is effected by vacuum to bring a photomask 1 and the correction plate 8 into completely tight contact with each other. When the dimensions of a rectangular opening 24 projected onto the surface of the mask are adjusted to a white spot defect 4, another rectangular opening 26 is moved in connection with the adjustment to concentrate laser light 21 onto the metal film 9b in the same shape and dimensions as the image of the opening 24 to vaporize the metal film and correct the defect. According to this method, the projected shape and dimensions of the laser light can be adjusted to the defect from the side of an observer to perform working and the number of working steps is greatly reduced.</p>
申请公布号 JPS561532(A) 申请公布日期 1981.01.09
申请号 JP19790075706 申请日期 1979.06.18
申请人 HITACHI LTD 发明人 MIYAUCHI TAKESHI;HONGOU MIKIO;MIZUKOSHI KATSUROU
分类号 G03F1/00;G03F1/72;H01L21/027 主分类号 G03F1/00
代理机构 代理人
主权项
地址