| 摘要 |
PURPOSE:To protect a substrate holding plate from wear due to etching and enable the repeated use of the plate, by fitting substrate holding metal hooks in the holes of the substrate holding plate made of a metal oxide or Si carbide. CONSTITUTION:A plurality of through holes 3 are provided in a substrate holding plate 1 made of a metal oxide or Si carbide. Substrate holding hooks made of a metal are attached to the holding plate 1 by the through holes 3. The holding plate is made of such a chemically stable substance of high melting point as the metal oxide (Al2O3, Ta2O5, etc.) or Si carbide (SiC etc.). The hooks 2 are made of the metal such as Pt which can be easily worked and is chemically stable and has a high metling point. In gas-phase deposit treatment, the substrate holding plate is not etched even if a deposit on the jig is etched off by hydrofluoric acid or a mixed solution of nitric acid with hydrofluoric acid. Therefore, the jig does not suffer from wear such as surface roughening. |
