Lithographic process for lacquered semiconductor - applies radiation of two types in first even stage followed by longer stage

摘要

The corpuscular or X-ray lithographic process for semiconductor bodies coated with a lacquer applies the radiation for controlled intervals of time. A first dose of radiation can be applied evenly over the resist, then a second dose is applied to obtain the required structure. The even dosage is applied integrally, and electrons can be used for the second dosage. The first dosage can be up to 30 percent of the overall dosage. A different type of radiation is used for one dosage than that used for the other, and the resist must correspond to both types.