发明名称 Mask positioning system for semiconductor manufacture - uses symbols on each layer supplying positional information for computerised control system
摘要 <p>The method of checking the positions of a set of masks used in integrated circuit manufacture uses a special identifying symbol for each mask. The structure of each mask is formed so that the symbol projects at a given point different from the others, which identify different components on each mask layer. When the layers are superimposed, the location of the symbols ensures that the conductors on each layer line up with the conductors on other layers at required positions. The individual stages of alignment are carried out by a computer system, and the symbols are used to provide positional information which is fed into the computer.</p>
申请公布号 DE2923976(A1) 申请公布日期 1981.01.08
申请号 DE19792923976 申请日期 1979.06.13
申请人 SIEMENS AG 发明人 HAHN,KURT,DIPL.-ING.
分类号 G06F17/50;H01L21/66;H01L27/02;(IPC1-7):01L21/66;01L21/72 主分类号 G06F17/50
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