发明名称 HALBLEITERANORDNUNG
摘要 A bipolar transistor comprises an n-type Si semiconductor body having a convex portion, an insulation film covering the surface of the semiconductor body other than the convex portion, and a p-type polycrystalline Si layer formed on the insulation film. A p-type region formed in the convex portion serves as an intrinsic base region, the polycrystalline Si layer serves as an extrinsic base region, an n-type region formed in the intrinsic base region serves as an emitter region, and the body serves as a collector region.
申请公布号 DE3022565(A1) 申请公布日期 1981.01.08
申请号 DE19803022565 申请日期 1980.06.16
申请人 HITACHI,LTD. 发明人 NAKAMURA,TOHRU;MIYAZAKI,TAKAO;TAKAHASHI,SUSUMU;IMAIZUMI,ICHIRO;OKABE,TAKAHIRO;NAGATA,MINORU;KAWAMURA,MASAO
分类号 H01L21/20;H01L21/285;H01L21/331;H01L21/8226;H01L23/532;H01L27/02;H01L27/06;H01L27/082;H01L29/08;H01L29/10;H01L29/423;H01L29/45;H01L29/73;(IPC1-7):H01L29/72;H01L29/78;H01L27/04;G11C11/40 主分类号 H01L21/20
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