| 摘要 |
PURPOSE:To effect convenient application of a sputtering apparatus to experimental research with reduced cost by a construction wherein the rotary shafts of a vacuum chamber containing substrate and cathode are so arranged as to allow the cathode to be located in any of vertical and horizontal positions in relative to the substrate. CONSTITUTION:A vacuum chamber 1 containing a substrate 5 and a cathode 8 is supported by a support frame 4 so that the chamber 1 can be freely rotated by rotary shafts 2, 3. The substrate 5 is mounted at the center section of the chamber 1 by means of a supporting part 6 passing through the rotary shaft 2. A target 7 is mounted to the cathode 8. An exhaust duct is connected through the rotary shaft 3 to an exhaust pump 9. All these constitute a sputtering apparatus. As a result, the rotation of the vacuum chamber 1 allows the relative position of the substrate 5 and the target 7 to take any position in vertical and horizontal directions. Thus, in experiments and researches, the time and cost for changing the operating positions is drastically reduced as compared with conventional method. |
