ELECTRON BEAM EXPOSURE DEVICE

摘要

PURPOSE:To enable drawing of a slant line with excellent outlines in addition to a vertical and a horizontal lines by giving a uniform irradiation of the electron beam of an electron gun on the aperture plate having an octagonal or a hexagonal opening over the surface of a sample. CONSTITUTION:An electron beam is radiated from an electron gun 2 and a uniform irradiation of the electron beam is projected on an aperture plate 6. A pattern is drawn on the surface of a sample 12 with electron lenses 4a-4d. In this instance, a plate with an octagonal or a hexagonal opening is used as an aperture plate. Hence, an excellent slant line can be drawn in addition to a vertical and a horizontal lines.