| 摘要 |
PURPOSE:To obtain a photo mask which is superior in workability during use and permits formation of products with a good yield by forming the deposition regions of thin-film patterns convex and other regions concave thereby forming a substrate surface. CONSTITUTION:The surface of a photo mask substrate 1 is formed to the shape in which the regions (dark portions) of the patterns 4 formed by metal (oxide) thin films become convex and the regions (bright portions) other than the foregoing regions become concave. Namely, a thin film 2 of metal (oxide) is provided on the surface of the photo mask substrate 1 made of material such as glass or quartz, and the photoresist patterns 3 are formed through patterning thereon. Next, with the resist patterns 3 as a protecting film, the thin film 2 is etched to form thin film patterns 4, thence with the resist patterns 3 and thin film patterns 4 as protecting films, the substrate 1 is etched to form concave parts 5, after which the resist patterns 3 are removed, whereby the photo mask is obtained. |
