发明名称 Process for the production of high purity silicon monocrystals having a low oxygen content
摘要 The invention provides a process according to which the oxygen content in crucible-drawn silicon crystals can be lowered and kept substantially constant throughout the length of the rod. This is achieved in that, after applying the seed crystal to the melt pool, the silicon rod being drawn from the melt pool is initially rotated at a speed from 3 to 6 rev/min and this rotational speed is preferably increased to higher values during the drawing process.
申请公布号 US4239585(A) 申请公布日期 1980.12.16
申请号 US19780954518 申请日期 1978.10.25
申请人 WACKER-CHEMITRONIC ELEK GRUNDSTOFFE 发明人 KOHL, FRANZ
分类号 C30B15/00;C30B15/30;C30B29/06;H01L21/208;(IPC1-7):C30B15/00 主分类号 C30B15/00
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