发明名称 |
SOURCE POSITION METER FOR EXPOSURE BASE |
摘要 |
PURPOSE:To improve the accuracy of exposure by providing a plurality of observing devices while facing against the light source of exposure base and adjusting the position of light source with reference to the output data from said device. CONSTITUTION:Observing devices 141-149 are arranged on a fixed frame 15. A pin hole 15 is provided in the observing device 14 while facing against the light source 11 while a semiconductor line sensor 16 is arranged in the inside. A fixed frame 15 is mounted on a referential exposure base 13 then positioned and fixed by a stopper 16 comprised of a semiconductor line sensor. The position of light source is measured by the output from each observing device which is provided to a digital indicator 17. Forward and reverse shift against the stored image of light source 11 is indicated on the digital indicator 17. |
申请公布号 |
JPS55159539(A) |
申请公布日期 |
1980.12.11 |
申请号 |
JP19790067079 |
申请日期 |
1979.05.30 |
申请人 |
TOKYO SHIBAURA ELECTRIC CO |
发明人 |
MIYATA YUKITAKA;GOUSHI SEIJI |
分类号 |
H01J9/227;G01B11/00;H01J9/20;H01J9/42 |
主分类号 |
H01J9/227 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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