发明名称 SOURCE POSITION METER FOR EXPOSURE BASE
摘要 PURPOSE:To improve the accuracy of exposure by providing a plurality of observing devices while facing against the light source of exposure base and adjusting the position of light source with reference to the output data from said device. CONSTITUTION:Observing devices 141-149 are arranged on a fixed frame 15. A pin hole 15 is provided in the observing device 14 while facing against the light source 11 while a semiconductor line sensor 16 is arranged in the inside. A fixed frame 15 is mounted on a referential exposure base 13 then positioned and fixed by a stopper 16 comprised of a semiconductor line sensor. The position of light source is measured by the output from each observing device which is provided to a digital indicator 17. Forward and reverse shift against the stored image of light source 11 is indicated on the digital indicator 17.
申请公布号 JPS55159539(A) 申请公布日期 1980.12.11
申请号 JP19790067079 申请日期 1979.05.30
申请人 TOKYO SHIBAURA ELECTRIC CO 发明人 MIYATA YUKITAKA;GOUSHI SEIJI
分类号 H01J9/227;G01B11/00;H01J9/20;H01J9/42 主分类号 H01J9/227
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