发明名称 |
Doping silicon with carrier life time extender - using lead metal or gaseous compound by high temp. diffusion |
摘要 |
<p>Highly pure polycrystalline or monocrystalline Si with semiconducting properties is produced by diffusing into pure Si a carrier lifetime extending substance such as Pb. The Pb is used in the form metallic Pb, PbI2, PbCl2, Pb(C2H5)4, Pb(CH3)4 or PbCH(COO)2. The Si may be in lump form or as wafers and the Pb is diffused in gaseous form, pref. during crucible-free zone melting. Used in mfr. of optoelectronic components esp. solar cells. The recombination rate of the carriers in the Si is reduced.</p> |
申请公布号 |
DE2922055(A1) |
申请公布日期 |
1980.12.11 |
申请号 |
DE19792922055 |
申请日期 |
1979.05.30 |
申请人 |
SIEMENS AG |
发明人 |
SCHINK,NORBERT,DIPL.-CHEM.DR. |
分类号 |
H01L21/205;H01L21/208;H01L21/322;H01L29/167;(IPC1-7):30B31/06;30B29/06 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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