| 摘要 |
PURPOSE:To make positioning detection of an electron beam rapidly and with high precision by a method wherein a burr is not formed on an element pattern but only on a mark when positioning the electron beam with the pattern. CONSTITUTION:A hollow portion 21 of a depth D is provided on a surface in which a position reference mark of a substrate 1 is to be provided, and a film 2 which will become an element pattern and a mark later is coated inside the hollow portion 21 and on the surface of the substrate 1. Then, a resist film 3 is coated in spin on the whole surface, however, the surface is made nearly even since the film 3 is in liquid stands. After that, the film 3 is made to remain only on the element pattern 6 to be formed by pattering and on the position reference mark 4 inside the hollow portion 21, and is provided with etching to remove an exposed portion of the film 2. When the film 3 is removed after that, a burr of a hight H+D is produced on a circumferential edge of the mark 4 where a thickness of the pattern 6 is given as H, and the mark 4 becomes useful when positioning an electronic resist 7 provided on the burr 5 with the pattern 6. |
