| 摘要 |
PROBLEM TO BE SOLVED: To provide a parallel-line mask composed of short fibers, in which the variation of a stripe width i.e., pitch is reduced and parallel pitch is maintained with high accuracy. SOLUTION: The parallel-line-type mask can be manufactured by: regarding a part forming a parallel-line mask part as the warp or weft, preparing masking cloth into which the warp or weft is woven and in which the parallel pitch of the warp or weft is held, allowing the cloth to adhere to a mask frame or plate-like substrata, and then removing the warp or weft to form a parallel- line mask part; or arranging the warp for forming a parallel-line mask part into parallel form by the use of a metal reed or a pitch gage jig and allowing the warp in a stretched state to adhere to the mask frame or plate-like substrate to form a parallel-line mask part. By this method, the manufacturing process can be remarkably shortened as compared with that by the conventional method by photolithography, and also the parallel-line-type mask in which stripe width i.e., pitch dispersion is minimized even in the case of parallel pitch as fine as 330μm and the parallel pitch is held with high accuracy can be obtained. This parallel-line-type mask can be suitably used, e.g. for a vapor deposition mask.
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