| 摘要 |
PURPOSE:To obtain a positive type resist material having high sensitivity, superior heat resistance and superior etching resistance by copolymerizing methyl methacrylate and t-butyl methacrylate. CONSTITUTION:Methyl methacrylate and t-butyl methacrylate are copolymerized to form a copolymer contg. about 5-50mol% t-butyl methacrylate units and having a wt. average mol. wt. of 100,000-several millions, a dispersion degree of about 4 or less and a glass transition point of about 100 deg.C or below. When this copolymer is used as a resist material, it is dissolved in a low-viscosity volatile org. solvent such as toluene or trichloroethylene, and the resulting soln. is coated onto a body and heat treated at about 200-270 deg.C to form a film. |
