发明名称 PROCESSING STAGE, FOCUSED BEAM PROCESSING APPARATUS, AND FOCUSED BEAM PROCESSING METHOD
摘要 <p>A processing stage capable of efficiently processing workpieces by easily transferring them without exposing to the outside, a focused beam processing apparatus, and a focused beam processing method. The processing stage (4) is used to process the workpieces (D) and (L) by radiating a focused beam (B) thereon while observing the workpieces (D) and (L) in an observation area (W) within a predetermined range. The processing stage comprises a table (10) having a plurality of placing tables (2) and (3) for placing the workpieces (D) and (L) on the upper surfaces (2a) and (3a) thereof and a rotating and tilting means (11) rotating the placing tables (2) and (3) around a Z-axis vertical to the upper surfaces (2a) and (3a) and tilting the upper surfaces (2a) and (3a) to any angles. The table (10) is formed movable so that the plurality of placing tables (2) and (3) can be disposed in the observation area (W).</p>
申请公布号 WO2006092975(A1) 申请公布日期 2006.09.08
申请号 WO2006JP302989 申请日期 2006.02.21
申请人 ADACHI, TATSUYA;SII NANOTECHNOLOGY INC. 发明人 ADACHI, TATSUYA
分类号 G01N1/28;G01N1/32;H01J37/20;H01J37/317 主分类号 G01N1/28
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