发明名称 |
PROCESSING STAGE, FOCUSED BEAM PROCESSING APPARATUS, AND FOCUSED BEAM PROCESSING METHOD |
摘要 |
<p>A processing stage capable of efficiently processing workpieces by easily transferring them without exposing to the outside, a focused beam processing apparatus, and a focused beam processing method. The processing stage (4) is used to process the workpieces (D) and (L) by radiating a focused beam (B) thereon while observing the workpieces (D) and (L) in an observation area (W) within a predetermined range. The processing stage comprises a table (10) having a plurality of placing tables (2) and (3) for placing the workpieces (D) and (L) on the upper surfaces (2a) and (3a) thereof and a rotating and tilting means (11) rotating the placing tables (2) and (3) around a Z-axis vertical to the upper surfaces (2a) and (3a) and tilting the upper surfaces (2a) and (3a) to any angles. The table (10) is formed movable so that the plurality of placing tables (2) and (3) can be disposed in the observation area (W).</p> |
申请公布号 |
WO2006092975(A1) |
申请公布日期 |
2006.09.08 |
申请号 |
WO2006JP302989 |
申请日期 |
2006.02.21 |
申请人 |
ADACHI, TATSUYA;SII NANOTECHNOLOGY INC. |
发明人 |
ADACHI, TATSUYA |
分类号 |
G01N1/28;G01N1/32;H01J37/20;H01J37/317 |
主分类号 |
G01N1/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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