| 摘要 |
PURPOSE:To eliminate unevenness in a pit after development processing by specifying the quantity of diffracted light of each degree, which constitutes respective combinations, passing through a image-forming lens according to the combination mode of diffracted light beams differing in degree. CONSTITUTION:Light led from laser light source 2 is changed into diffracted beams differing in degree by slit S provided to light shielding member 8d of optical system 8, and the diffracted light beams, differing in degree, defined as ones passing through image-forming lens 10 are damped individually, as much as fixed, by damping member 11 provided behind reflex mirror 9. Since the intensity of each different- degree diffracted light beams passing through this damping member 11 and image- forming lens 10 is a fixed value respectively, the longitudinal section of a pit of photoresist after development processing has no unevenness. |
