| 摘要 |
PURPOSE:To enable resist to be exposed light on round-trip passages, by conducting electronic beam horizontal (vertical) scanning with artificial electrical pulse of a horizontal (vertical) direction measuring equipment. CONSTITUTION:With division of IC mask into frames, frame F1 is scanned by shifting it mechanically in direction Y and then frame F2 is scanned in the opposite direction by deflecting it by one frame in direction X. Exposure starting position is memorized by latch LAT, and by comparing with values counted by CRT, differences in value (Adder Output) are put into X-direction deflector 12 and Y-direction deflector 13, respectively, for deflection 17, so that variation of the starting position by shifting of table 10 can be prevented. On the other hand, by output pulses of length measurement passages 15 and 16, amounts of shifting of the table 10 in directions X and Y are CTR counted and additionally deflected. By giving reference voltage from central processing unit CPU on the basis of value of deflection sensitivity, fine adjustment of output of deflector DAC is made and beam 11 is deflected. It is possible, by doing so, to scan fixed beam in such a manner as if table is shifted, and also connection between frames can be depicted by image with rapidity and accuracy. |
