| 摘要 |
PURPOSE: An exposure system is provided to be capable of improving the image contrast by forming a dummy grating mask pattern for controlling transmittance of dark area of a reticle at a conjugate plane of an illumination part. CONSTITUTION: An exposure system comprises an illumination part(I) and a projection part(II). The illumination part(I) is provided with a condensing lens(130) and a reticle(140). The exposure system further includes a dummy grating mask pattern(120) for controlling the transmittance of the reticle(140). The dummy grating mask pattern(120) is located at a conjugate plane of the illumination part(I). At this time, the grating of the dummy grating mask pattern(120) has the same pitch to the pitch of the corresponding device. |
