发明名称 SPUTTERING APPARATUS
摘要 PURPOSE:To form a film of uniform thickness very easily on the inner surface of a spherical substrate in sputtering a film of a dielectric material on the inner surface of a spherical substrate, by arranging a spherical high frequency electrode applied with the material of the film, in the spherical substrate, then by producing glow discharge between the spherical electrode and an earth electrode. CONSTITUTION:A spherical substrate 9, which is similar in shape to a globe of lighting apparatus, is arranged in a vacuum vessel, then the vessl is evacuated and an atmosphere gas is introduced at a constant pressure. A spherical, high frequency electrode 11 applied with a film material 13 is arranged in the center of the spherical substrate 9, and glow discharge is produced between the spherical electrode 11 and a lower cylindrical each electrode 16, whereby the film material 13 painted on the electrode 11 is sputtered by the glow discharge and adheres to the inner surface of the spherical substrate 9 to form a film. Because the high frequency electrode 11 is spherical, the distance from the inner surface of the spherical substrate to the film material is equal at all points of the substrate, so that a film of uniform thickness is formed on the inner surface of the spherical substrate 1.
申请公布号 JPS55141565(A) 申请公布日期 1980.11.05
申请号 JP19790046741 申请日期 1979.04.18
申请人 IWASAKI ELECTRIC CO LTD 发明人 IWAI IKUO;YOSHIIKE HISAO
分类号 C03C17/245;C23C14/04;C23C14/24;C23C14/34;H01J37/34 主分类号 C03C17/245
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