| 摘要 |
PURPOSE:To fabricate a thin film element having preferable workability by photoetching several times to form a substrate pattern on a glazed ceramic substrate so as to form arcuate steps at both ends of the basic pattern and forming a forming resist thereon. CONSTITUTION:A basic pattern resist 11 is formed on a glazed ceramic substrate 1, and a basic pattern 13 is formed thereon by etching process. Then, a basic pattern resist 12 having slightly narrower than the basic pattern 13 is formed thereon and so etched that the wide surface of the basic pattern 13 is slightly retained. Thus, the basic pattern 13 is formed with arcuate steps 9 at both right and left side ends thereof, and the resultant steps 9 which are continuously etched at the edges may become arcuate. When a forming resist 8 is formed on the basic pattern 13' of this shape, there can be obtained a thin film element in which no gap is formed but it is formed integral. |
