| 摘要 |
PURPOSE:To retouch a photogravure plate while providing high adherence and superior solvent and printing resistances by filling up unnecessary recesses of the plate with a photosetting liq. resin as a retouching liq. followed by exposure and setting. CONSTITUTION:Unnecessary recesses such as pinholes and scratches of a photogravure plate made of copper, polyamide type photosensitive resin or the like are filled up with a retouching liq. contg. a photosetting resin formed by bonding an oligomer or a prepolymer of epoxy acrylate, polyester acrylate, urethane acrylate or the like and (meth)acrylic acid while leaving the double bond of the acid, a viscosity regulator such as a photoreactive monomer, a nonphotoreactive plasticizer or a mixture thereof, and photosetting reaction initiator such as benzophenone. The filled liq. is then set by irradiation with a mercury lamp or the like, and the surface is planed by polishing. Thus, a retouched photogravure plate giving a fine printed image is obtd. |
