发明名称 PHOTOGRAPHIC MATERIAL HAVING ANTISTATIC LAYER
摘要 PURPOSE:To obtain a photographic material having an antistatic layer free from elution in development and exhibiting superior scratch resistance by laminating a hydrophobic polymer layer, an electrically conductive layer and a hydrophobic polymer layer insoluble in a photographic treating soln. on the back side of support. CONSTITUTION:A layer (a) of a hydrophobic polymer such as org. solvent-soluble polyester resin or ethyl acrylate-glycidyl methacrylate copolymer, an alumina sol layer (electrically conductive layer) (b) made of aluminum oxide colloid contg. about 10<-4>-10<-2>mol/g of an electrolyte such as inorg. acid or carboxylic acid, and an about 0.05-3mu thick layer (c) of a hydrophobic polymer such as cellulose acetate or polyvinyl acetal which is essentially insoluble in a photographic material treating soln. are laminated in this order on the back side of a polyethylene terephthalate support with a photographic material covered on the surface. The amount of the layer (a) applied is about 0.03-3g/m<2>, and the amount of layer (b) about 5-500mg/m<2>.
申请公布号 JPS55140834(A) 申请公布日期 1980.11.04
申请号 JP19790048225 申请日期 1979.04.19
申请人 KONISHIROKU PHOTO IND 发明人 KOBAYASHI TOORU;NAGAYASU KOUICHI;MIURA YOSHIYUKI;TAKAHASHI NENSHIYOU
分类号 C09K3/16;G03C1/85 主分类号 C09K3/16
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