| 摘要 |
<p>A method for manufacturing OPC(Optical Proximity Correction) mask is provided to enhance process margin by using optimized OPC model considering step height. A method for manufacturing optical proximity correction mask comprises the following steps: a step for inserting a test pattern for OPC model; a step for extracting a pattern size(CD) in the test pattern for the OPC model; a step for setting up each OPC model with a set up file after generating each OPC set up file considering the pattern size; a step for manufacturing a mask by performing OPC with each OPC model; a step for detecting gap generation region with CMP(Chemical Mechanical Polishing) simulation result map; and a step for applying the OPC model to detected region.</p> |
