| 摘要 |
PURPOSE:To adjust the focus of an ion beam by forming a thin film by using a substrate or a material on the substrate which emits light when exposed to an electron beam and making a mark on this thin film for ascertaining the position of an electron beam. CONSTITUTION:In manufacturing an ion beam adjusting element of an Auger electron spectroscope to analyze a substance using both electron beam and ion beam, thin film 2 is formed on substrate 1 of Al2O3 by using a material, such as TaN, which is caused to emit light by an electron beam at above several hundred eV. On this film 2 is formed mark 5 by a glass cut to ascertain the position of electron beam 3. The part which is caused to emit light by electron beam 3 is set in the center of this mark 5. Then, sputter etching is operated on film 2 by ion beam 4 to the extent that substrate 1 is visible. Thus, by grasping the relative position of electron beam and ion beam accurately, ion beam adjustment and the preservation of the record of the relative position are simplified. |
