| 摘要 |
A diazo film developing apparatus and method in which an exposed diazo film (36) is moved through a heated developing chamber (16) and is contacted by ammonia vapor which develops the film. Aqueous ammonia is fed into a separation chamber (20) connected with said developing chamber (16) and the ammonia is separated from the water by heating and introduced into the developing chamber (16). A thermal control means (62) is provided between said developing chamber (16) and said separation chamber (20) to maintain a temperature differential therebetween, said separation chamber (20) having a temperature lower than the temperature of the developing chamber (16). In the preferred embodiment the separation chamber is in the form of a cavity or trough in the bottom of the developing chamber (16). |
