| 摘要 |
The present invention provides an exposure apparatus including a position detection apparatus that detects at least one of a position of a reticle and a position of a substrate. The position detection apparatus includes an optical member whose position can be changed, a photoelectric conversion device that receives light from a mark and outputs a detection signal, and a control unit that controls the position of the optical member based on information on a first evaluation value representing a symmetry of a waveform of the detection signal at each of a plurality of positions of the optical member and information on a second evaluation value representing a position shift of the mark detected upon changing a position of the mark in an optical axis direction of an optical system at each of the plurality of positions of the optical member.
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