发明名称 SEMICONDUCTOR DEVICE
摘要 Although in the semiconductor device using a hetero junction including an electron transport layer of GaN and an electron supply layer of AlGaN, etc. normally off can be made by forming a p-type layer between the electron supply layer and a gate electrode, on-resistance is high because the surface of the electron supply layer becomes rough when forming the p-type layer in a local area. To solve this problem, an insulation layer covering the surface of the electron supply layer exposed between the source electrode and the p-type layer and the surface of the electron supply layer exposed between the drain electrode and the p-type layer can be charged positive. Thus, two-dimensional electron gas concentration applied to the hetero junction rises so that the on-resistance can be lowered.
申请公布号 KR20160087752(A) 申请公布日期 2016.07.22
申请号 KR20160001520 申请日期 2016.01.06
申请人 TOYOTA JIDOSHA KABUSHIKI KAISHA 发明人 TOMITA HIDEMOTO;KANECHIKA MASAKAZU;UEDA HIROYUKI
分类号 H01L29/778;H01L21/04;H01L29/78 主分类号 H01L29/778
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