发明名称 |
ELECTRON ACCELERATOR WITH A TARGET EXPOSED TO THE ELECTRON BEAM |
摘要 |
<p>In an electron accelerator having a target which is subjected to an electron beam for the production of deceleration radiation, a collimator is provided behind the target which has a passageway adapted to receive a beam cone of maximum dimensions. Adjustable x-ray aperture plates are provided behind the collimator and an electron absorber is provided behind the target. An additional electron absorber is positioned in a widened portion at one end of the passageway in the collimator. Both electron absorbers are made of a material having a relatively low atomic number as compared with electron absorbers of the prior art.</p> |
申请公布号 |
CA1088222(A) |
申请公布日期 |
1980.10.21 |
申请号 |
CA19770286197 |
申请日期 |
1977.09.07 |
申请人 |
SIEMENS AKTIENGESELLSCHAFT |
发明人 |
SCHITTENHELM, RUDOLF;TAUMANN, LEONHARD |
分类号 |
G21K5/08;G21K1/02;G21K1/10;H01J35/08;H05G1/00;(IPC1-7):05G1/02 |
主分类号 |
G21K5/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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