发明名称 ELECTRON ACCELERATOR WITH A TARGET EXPOSED TO THE ELECTRON BEAM
摘要 <p>In an electron accelerator having a target which is subjected to an electron beam for the production of deceleration radiation, a collimator is provided behind the target which has a passageway adapted to receive a beam cone of maximum dimensions. Adjustable x-ray aperture plates are provided behind the collimator and an electron absorber is provided behind the target. An additional electron absorber is positioned in a widened portion at one end of the passageway in the collimator. Both electron absorbers are made of a material having a relatively low atomic number as compared with electron absorbers of the prior art.</p>
申请公布号 CA1088222(A) 申请公布日期 1980.10.21
申请号 CA19770286197 申请日期 1977.09.07
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 SCHITTENHELM, RUDOLF;TAUMANN, LEONHARD
分类号 G21K5/08;G21K1/02;G21K1/10;H01J35/08;H05G1/00;(IPC1-7):05G1/02 主分类号 G21K5/08
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