发明名称 |
Photo-polymerization and development process which produces dot-etchable material |
摘要 |
Photopolymerizable elements are described comprising a sheet support, a photopolymerizable layer having a thickness of, at most, 0.0006 inch (0.015 mm.) and an optical density of at least 3.0 in the actinic region. Resist images made from these elements may be etched by a process of chemically undercutting the image areas and then spraying or rubbing them. The elements are useful as contact speed lithographic films and for other graphic arts applications.
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申请公布号 |
US4229520(A) |
申请公布日期 |
1980.10.21 |
申请号 |
US19790049314 |
申请日期 |
1979.06.18 |
申请人 |
E. I. DU PONT DE NEMOURS AND COMPANY |
发明人 |
BRATT, MARTIN D.;COHEN, ABRAHAM B. |
分类号 |
G03F1/10;G03F3/10;G03F7/30;(IPC1-7):G03C5/00;G03C1/68 |
主分类号 |
G03F1/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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