发明名称 MASK OR WAFER HAVING TARGET AND METHOD AND DEVICE FOR USING SAME
摘要 A target for use in aligning masks used in producing microcircuits which is of a size that can be printed on a microcircuit chip without interfering with the lines thereon, consisting only of lines vertically or diagonally disposed with respect to the image transducer is disclosed. Also disclosed is an automatic system for aligning such targets.
申请公布号 JPS55133539(A) 申请公布日期 1980.10.17
申请号 JP19800030441 申请日期 1980.03.12
申请人 PERKIN ELMER CORP 发明人 DANIERU HAABAATO BERII;DEIBUITSUTO EI MAAKURU
分类号 H01L21/30;G03F9/00;G03F9/02;H01L21/027;H01L21/68 主分类号 H01L21/30
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