| 摘要 |
PURPOSE:To analyze all elements contained in the same sample with high sensitivity by providing a Cs molecular beam deposition device whose sample chamber is provided with shutter and a mechanism to introduce O2 into the sample chamber. CONSTITUTION:When analyzing elements with a higher sensitivity of positive ion, e.g., Fe, etc., the shutter 19 of the Cs molecular beam deposition device 14 is closed and the valve 20 is opened to introduce O2, whereupon the sensitivity of Fe is increased approx. 10<3> times. Thus, if O2 is introduced and the emission of Cs is selected according to element to be analyzed, all elements can easily be analyzed with high sensitivity by one mass spectrometer, leaving primary ion Ar<+> intact. Also, in cases where elements whose sensitivity is increased by Cs emission and elements whose sensitivity is increased by the introduction of O2 are obtained in the same sample, two mass spectrometers are used. Also, if positive and negative secondary ions are detected by the lock-in amplifier 26 by introducing O2 in an amount enough to be adsorbed in the surface of sample and using as a reference signal of the chopping frequency by the shutter 19 of Cs beam, both ions can be measured concurrently with high sensitivity. |
